Vacuum Technology and Applications
| By: | David J. Hucknall |
| Publisher: | Elsevier S & T |
| Print ISBN: | 9780750611459 |
| eText ISBN: | 9781483103334 |
| Edition: | 0 |
| Copyright: | 1991 |
| Format: | Page Fidelity |
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Vacuum Technology and Applications reviews the most commonly encountered methods for the production, containment, and measurement of subatmospheric pressure. This book also outlines a number of very important applications of this technology. This text is organized into eight chapters and begins with a brief survey of the fundamental principles of vacuum technology. The succeeding chapters deal with the pumps used for the production of rough-medium and high-ultra-high vacua. These chapters specifically cover their principles, performance, and applications. These topics are followed by a discussion of the devices for residual gas analysis and partial pressure measurement. Other chapters consider the aspects of leak detection using He-specific mass spectrometer and the materials, components, and fabrication of vacuum devices. The final chapters explore the application of vacuum technology in critical areas of industrial activity, such as thin-film technology, semiconductor, metallurgy, and chemical industry. This book will prove useful to practicing mechanical, chemical, and design engineers.