Photon, Beam and Plasma Assisted Processing: Fundamentals and Device Technology
| By: | Krimmel, E.F.; Boyd, I.W. |
| Publisher: | Elsevier S & T |
| Print ISBN: | 9780444873019 |
| eText ISBN: | 9780444596369 |
| Edition: | 1 |
| Format: | Page Fidelity |
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This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.