Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications
| By: | Francombe, Maurice H. |
| Publisher: | Elsevier S & T |
| Print ISBN: | 9780125330237 |
| eText ISBN: | 9780080542904 |
| Edition: | 0 |
| Format: | Page Fidelity |
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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.