Photomask Fabrication Technology
| By: | Eynon, Benjamin; Wu, Banqiu |
| Publisher: | McGraw-Hill Professional |
| Print ISBN: | 9780071445634 |
| eText ISBN: | 9780071445634 |
| Edition: | 1 |
| Copyright: | 2005 |
| Format: | Page Fidelity |
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Table of Contents
Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.